The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2022
Filed:
Jan. 10, 2020
Applicant:
Advanced Mask Technology Center Gmbh & Co. KG, Dresden, DE;
Inventors:
Assignee:
ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG, Dresden, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 1/48 (2012.01); G03F 1/52 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/48 (2013.01); G03F 1/52 (2013.01); G03F 1/60 (2013.01);
Abstract
A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius.