Dresden, Germany

Markus Bender

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.8

ph-index = 1


Company Filing History:


Years Active: 2016-2022

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3 patents (USPTO):

Title: Innovations of Markus Bender in Photomask Technology

Introduction

Markus Bender is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of photomask technology, holding three patents that showcase his innovative approach to manufacturing reflective photomasks.

Latest Patents

His latest patents include a "Photomask assembly with reflective photomask and method of manufacturing a reflective photomask." This invention features a photomask assembly that includes a reflective photomask and a protection structure. The reflective photomask consists of a substrate and a reflective multilayer on the front side of the substrate. The protection structure is located on the backside of the reflective photomask and can be detached at temperatures below 150 degrees Celsius. Another significant patent is the "Reflective photomask and reflection-type mask blank." This patent describes a reflective photomask that includes a substrate made of low thermal expansion material, featuring a multilayer mirror with at least 50% reflectivity at exposure wavelengths below 15 nm.

Career Highlights

Markus Bender works at Advanced Mask Technology Center GmbH & Co. KG, where he continues to develop cutting-edge technologies in photomask manufacturing. His work has been instrumental in advancing the capabilities of photomasks used in various applications.

Collaborations

He collaborates with talented coworkers such as Thorsten Schedel and Andreas Schenke, contributing to a dynamic team focused on innovation in the field.

Conclusion

Markus Bender's contributions to photomask technology through his patents reflect his expertise and commitment to innovation. His work continues to influence the industry and pave the way for future advancements.

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