San Jose, CA, United States of America

Thomas W Mountsier


Average Co-Inventor Count = 3.4

ph-index = 17

Forward Citations = 1,761(Granted Patents)


Company Filing History:


Years Active: 1998-2019

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29 patents (USPTO):

Title: The Innovations of Thomas W. Mountsier

Introduction: Thomas W. Mountsier is a prolific inventor based in San Jose, California, holding a remarkable total of 29 patents. His inventive work primarily revolves around advanced techniques in etching, which are critical in the semiconductor industry. His contributions have significantly impacted the efficiency and effectiveness of etching processes used in various applications.

Latest Patents: Among his latest inventions is the patent titled "High Aspect Ratio Etch of Oxide Metal Oxide Metal Stack." This method provides a unique approach to etching features in an OMOM stack, which consists of alternating layers of silicon oxide and metal-containing materials. This innovation utilizes a hardmask that is patterned before etching the stack, effectively improving precision and detail in semiconductor fabrication. Another recent patent is "High Aspect Ratio Etch with Combination Mask." This method involves creating a combination hardmask that includes layers of carbon or silicon oxide and metal. Patterning these hardmask layers allows for a more controlled etching process through the stack, enhancing performance in high-technology applications.

Career Highlights: Throughout his impressive career, Thomas has been associated with leading firms such as Novellus Systems Incorporated and Lam Research Corporation. His experiences with these organizations have equipped him with a deep understanding of the semiconductor manufacturing processes and their associated challenges.

Collaborations: Thomas has collaborated with notable individuals in the industry, including Bart Jan van Schravendijk and Roey Shaviv. These partnerships have contributed to the advancement of innovative methodologies and techniques in etching, further solidifying his position as a key figure in the field.

Conclusion: Thomas W. Mountsier's contributions to the field of semiconductor etching exemplify the impact of innovation in technology. With a considerable number of patents to his name, he continues to push the boundaries of what is possible in semiconductor fabrication, paving the way for future advancements in the industry. His work not only reflects his expertise but also serves as an inspiration for aspiring inventors and industry professionals alike.

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