The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Mar. 31, 2014
Novellus Systems, Inc., Fremont, CA (US);
Adrien LaVoie, Newberg, OR (US);
Shankar Swaminathan, Beaverton, OR (US);
Hu Kang, Tualatin, OR (US);
Ramesh Chandrasekharan, Portland, OR (US);
Tom Dorsh, McMinnville, OR (US);
Dennis M. Hausmann, Lake Oswego, OR (US);
Jon Henri, West Linn, OR (US);
Thomas Jewell, Wilsonville, OR (US);
Ming Li, West Linn, OR (US);
Bryan Schlief, Tualatin, OR (US);
Antonio Xavier, West Linn, OR (US);
Thomas W. Mountsier, San Jose, CA (US);
Bart J. van Schravendijk, Cupertino, CA (US);
Easwar Srinivasan, Beaverton, OR (US);
Mandyam Sriram, Beaverton, OR (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.