Company Filing History:
Years Active: 2014-2016
Title: The Innovative Contributions of Bryan Schlief
Introduction
Bryan Schlief is a notable inventor based in Tualatin, Oregon. He has made significant contributions to the field of film deposition technology, holding 2 patents that showcase his innovative approach to substrate surface treatments.
Latest Patents
One of Bryan's latest patents is focused on plasma activated conformal film deposition. This method involves surface-mediated reactions where a film is deposited on a substrate surface through a series of reactant adsorption and reaction cycles. The process is characterized by several operations: first, the substrate surface is exposed to a first reactant in vapor phase, allowing it to adsorb onto the surface. Next, the surface is exposed to a second reactant in vapor phase while the first reactant remains adsorbed. Finally, plasma is applied to drive a reaction between the two adsorbed reactants, resulting in the formation of the film.
Career Highlights
Bryan Schlief is currently employed at Novellus Systems Incorporated, a company known for its advanced semiconductor manufacturing technologies. His work at Novellus has allowed him to develop and refine his innovative methods in film deposition.
Collaborations
Throughout his career, Bryan has collaborated with talented individuals such as Shankar Swaminathan and Hu Kang. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Bryan Schlief's contributions to the field of film deposition technology highlight his innovative spirit and dedication to advancing the industry. His patents reflect a deep understanding of the complexities involved in substrate surface treatments, making him a valuable asset in the realm of invention.