Novellus Systems Incorporated

Bryan Schlief

Ming Chu Li

Dennis Michael Hausmann

Shankar Swaminathan

Mandyam Sriram

Jon Henri

Ramesh Chandrasekharan

Hu Kang

Easwar Srinivasan

Thomas W Mountsier

Antonio Xavier

Thomas G Jewell

Tom Dorsh

Adrien Lavoie

Bart Jan Van Schravendijk

Adrien LaVoie

Bart K Van Schravendijk

Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film.

Plasma activated conformal film deposition

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Tualatin, OR, United States of America

Bryan Schlief