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For the Inventor, By the Inventor

Penfield, NY, United States of America

Thomas James Dunn

USPTO Granted Patents = 13 

 

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 40(Granted Patents)


Company Filing History:

goldMedal12 out of 7,268 
 
Corning Incorporated
 patents
silverMedal1 out of 1 
 
Corning-tropel
 patent

Years Active: 2004-2020

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13 patents (USPTO):
1. 10871369 - Systems for and methods of measuring photomask flatness with reduced gravity-induced error (2020-12-22),
2. 10488176 - Edge registration for interferometry (2019-11-26),
3. 9829310 - Interferometric roll-off measurement using a static fringe pattern (2017-11-28),
4. 9651358 - Grazing-incidence interferometer with dual-side measurement capability using a common image plane (2017-05-16),
5. 9513214 - Skewed sectional measurement of striated glass (2016-12-06),
6. 8531677 - Frequency-shifting interferometer with selective data processing (2013-09-10),
7. 8526008 - Interferometer with paraboloidal illumination and imaging optic and tilted imaging plane (2013-09-03),
8. 8218586 - Littman configured frequency stepped laser (2012-07-10),
9. 7916763 - Current driven frequency-stepped radiation source and methods thereof (2011-03-29),
10. 7268887 - Overlapping common-path interferometers for two-sided measurement (2007-09-11),
11. 7259860 - Optical feedback from mode-selective tuner (2007-08-21),
12. 7209499 - Mode-selective frequency tuning system (2007-04-24),
13. 6781699 - Two-wavelength confocal interferometer for measuring multiple surfaces (2004-08-24),

Title: Thomas James Dunn: Innovator in Photomask Measurement Technologies

Introduction

Thomas James Dunn is a notable inventor based in Penfield, NY (US). He holds a total of 13 patents that showcase his contributions to the field of photomask measurement technologies. His innovative approaches have significantly advanced the accuracy and efficiency of measurement systems.

Latest Patents

One of his latest patents is titled "Systems for and methods of measuring photomask flatness with reduced gravity-induced error." This patent describes methods that involve recording interferograms of the photomask surface at near-vertical measurement positions. The process includes defining a difference map based on these interferograms and measuring normal forces to obtain a compensated flatness measurement. Another significant patent is "Edge registration for interferometry," which details a metrology apparatus that utilizes collimated light and spatial filtering to enhance measurement accuracy.

Career Highlights

Throughout his career, Thomas has worked with prominent companies such as Corning Incorporated and Corning Tropel. His experience in these organizations has allowed him to develop and refine his innovative technologies in photomask measurement.

Collaborations

Thomas has collaborated with talented individuals in his field, including Christopher Alan Lee and Mark Joseph Tronolone. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Thomas James Dunn is a distinguished inventor whose work in photomask measurement technologies has made a significant impact in the industry. His innovative patents and collaborations reflect his commitment to advancing measurement accuracy and efficiency.

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