Location History:
- Tsukuba, JP (2010 - 2013)
- Yokohama, JP (2008 - 2016)
- Kanagawa, JP (2015 - 2016)
Company Filing History:
Years Active: 2008-2016
Title: Tetsu Morooka: Innovator in Semiconductor Technology
Introduction
Tetsu Morooka is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on the development of advanced semiconductor devices, which are crucial for modern electronics.
Latest Patents
Morooka's latest patents include innovative designs for semiconductor devices. One of his notable inventions describes a semiconductor device that features a gate electrode, a first dielectric film, an oxide semiconductor film, a second dielectric film, a source electrode, and a drain electrode. This design allows for a unique film thickness configuration in contact regions, enhancing the device's performance. Another patent outlines a semiconductor device that includes a first dielectric film above a gate electrode, an oxide semiconductor film, and a drain electrode with a drain contact portion. This configuration optimizes the connection between the oxide semiconductor film and the upper layer wiring.
Career Highlights
Throughout his career, Tetsu Morooka has worked with leading companies in the semiconductor industry. He has been associated with Toshiba Corporation and Renesas Electronics Corporation, where he contributed to various innovative projects. His expertise in semiconductor technology has positioned him as a key figure in the field.
Collaborations
Morooka has collaborated with notable professionals in the industry, including Tatsuya Ohguro and Hisayo S. Momose. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.
Conclusion
Tetsu Morooka's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative designs continue to impact the electronics industry significantly.
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