Company Filing History:
Years Active: 2012-2017
Title: Innovations of Tatsuyuki Saito
Introduction
Tatsuyuki Saito is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor device manufacturing. With a total of 13 patents to his name, Saito's work has had a considerable impact on the industry.
Latest Patents
One of his latest patents is a method of forming a metal-containing film. This innovative approach provides a semiconductor device manufacturing method and a substrate processing apparatus that can increase the work function of a film compared to related art. The method involves supplying a metal-containing gas simultaneously with an oxygen-containing gas, a halogen-containing gas, or combinations thereof into a processing chamber. Additionally, a nitrogen-containing gas is supplied with one of the aforementioned gases into the processing chamber.
Another notable patent is related to the manufacturing of semiconductor devices and substrate processing apparatus. This method allows for the rapid formation of a conductive film with a low concentration of impurities and low resistivity. The process is performed by simultaneously supplying two or more kinds of sources into a processing chamber to form a film on a substrate. It includes a first source supply process at a specific flow rate and a second source supply process at a different flow rate.
Career Highlights
Tatsuyuki Saito is currently employed at Hitachi Kokusai Electric Inc., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
Saito has collaborated with notable colleagues, including Masanori Sakai and Yukinao Kaga. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Tatsuyuki Saito's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing processes.