Company Filing History:
9 out of 68 
9 out of 25,543 
1 out of 1 Years Active: 1994-1998
Title: Innovations of Tatsuo Nakato
Introduction
Tatsuo Nakato is a prominent inventor based in Vancouver, WA (US). He holds a total of 11 patents, showcasing his significant contributions to the field of technology and materials science. His work primarily focuses on methods for fabricating advanced semiconductor structures.
Latest Patents
One of Nakato's latest patents is a method for forming silicon-germanium/Si/silicon dioxide heterostructures. This innovative method involves several steps, including providing a monocrystalline silicon substrate, defining a GeSi region within the substrate, and oxidizing part of the silicon cap to produce the desired heterostructure. Another notable patent is related to a silylated photo-resist layer and planarizing method. This technique includes coating a substrate with a planarizing resist layer, softbaking it in the presence of silicon-containing vapor or liquid, and subsequently applying an imaging resist layer. The process emphasizes the use of organic polymers and specific acid moieties to enhance the effectiveness of lithographic processes.
Career Highlights
Throughout his career, Tatsuo Nakato has worked with notable companies such as Sharp Microelectronics Technology, Inc. and Sharp Kabushiki Kaisha Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and materials engineering.
Collaborations
Nakato has collaborated with esteemed colleagues, including Narayanan Meyyappan and David A Vidusek. These partnerships have further enriched his research and development efforts in the field.
Conclusion
Tatsuo Nakato's innovative work and numerous patents reflect his significant impact on semiconductor technology. His contributions continue to influence advancements in the industry, showcasing the importance of innovation in driving technological progress.