Tatsuhiko Hirano

Title: Innovations of Tatsuhiko Hirano

Introduction

Tatsuhiko Hirano is a notable inventor based in Kiyosu, Japan. He has made significant contributions to the field of polishing compositions, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of polishing processes, particularly for objects with metal wiring layers.

Latest Patents

Hirano's latest patents include a polishing composition designed to address specific challenges in the polishing process. One of his innovations provides a polishing composition that is suitable for polishing a polishing object with a metal wiring layer. This composition is capable of diminishing step defects while maintaining a high polishing rate. The formulation includes a metal corrosion inhibitor, a complexing agent, a surfactant, and water. Notably, the solid surface energy of the polished object is 30 mN/m or less, with a preference for anionic surfactants. Another patent details a polishing composition that contains a water-soluble polymer, a polishing accelerator, and an oxidizing agent. The water-soluble polymer is a polyamide-polyamine polymer with an amine value of 150 mg KOH/1 g·solid or greater.

Career Highlights

Throughout his career, Tatsuhiko Hirano has worked with prominent companies in the industry, including Fujimi Incorporated and Fujima Incorporated. His experience in these organizations has allowed him to develop and refine his innovative polishing compositions.

Collaborations

Hirano has collaborated with notable colleagues such as Tsuyoshi Matsuda and Junhui Oh. Their combined expertise has contributed to the advancement of polishing technologies.

Conclusion

Tatsuhiko Hirano's contributions to the field of polishing compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in polishing processes and offer effective solutions for the industry.