The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Dec. 22, 2008
Applicants:

Tatsuhiko Hirano, Kiyosu, JP;

Hiroshi Mizuno, Kiyosu, JP;

Yasuyuki Yamato, Kiyosu, JP;

Akihito Yasui, Kiyosu, JP;

Inventors:

Tatsuhiko Hirano, Kiyosu, JP;

Hiroshi Mizuno, Kiyosu, JP;

Yasuyuki Yamato, Kiyosu, JP;

Akihito Yasui, Kiyosu, JP;

Assignee:

Fujimi Incorporated, Kiyosu-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/02 (2006.01); C09C 1/68 (2006.01); C09K 3/14 (2006.01); C09G 1/02 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/3212 (2013.01); C09K 3/1463 (2013.01);
Abstract

To provide a polishing composition which can satisfy both suppression of the surface topography and a high stock removal rate, in a polishing step in the production of a wiring structure. A polishing composition comprising abrasive grains, a processing accelerator, a nonionic surfactant represented by R-POE (I) (wherein R is a Calkyl group having a branched structure, and POE is a polyoxyethylene chain) and having an HLB of from 7 to 12, an anionic surfactant, a protective film-forming agent, an oxidizing agent, and water.


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