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For the Inventor, By the Inventor

Shizuoka, Japan

Takeshi Inasaki

This inventor holds 17 USPTO granted patents and 7 published patent applications and 5 EPO patents. Top assignees: Fujifilm Corporation, Fujitsu Corporation. Active years: 2012-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Inasaki. Retrieved from https://idiyas.com/inventor/takeshi-inasaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 82.4

 

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Haibara-gun, JP (2012 - 2017)
  • Shizuoka, JP (2014 - 2023)

Company Filing History:

goldMedal16 out of 16,949 
 
Fujifilm Corporation
 patents
silverMedal1 out of 39,374 
 
Fujitsu Corporation
 patents

Years Active: 2012-2023

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17 patents (USPTO):Explore Patents
1. 11543750 - Lithographic printing plate precursor and method for producing lithographic printing plate (2023-01-03),
2. 11294279 - Lithographic printing plate precursor, and method for producing lithographic printing plate (2022-04-05),
3. 11117364 - Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound (2021-09-14),
4. 10921712 - Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and color developing compound (2021-02-16),
5. 9826129 - Near-infrared-ray-absorbing composition, near-infrared-ray cut filter using same, manufacturing method therefor, camera module, and manufacturing method therefor (2017-11-21),
6. 9563121 - Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition (2017-02-07),
7. 9285679 - Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition (2016-03-15),
8. 9235120 - Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask (2016-01-12),
9. 9235116 - Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern (2016-01-12),
10. 9223204 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same (2015-12-29),
11. 9091927 - Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition (2015-07-28),
12. 8895222 - Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition (2014-11-25),
13. 8735048 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method (2014-05-27),
14. 8673538 - Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition (2014-03-18),
15. 8614033 - Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition (2013-12-24),

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Title: Takeshi Inasaki: Pioneering Innovation in Japan

Introduction:

Takeshi Inasaki is a visionary inventor whose passion for innovation and relentless pursuit of excellence have made him a prominent figure in the world of technology. Based in Shizuoka, Japan, Inasaki's groundbreaking work continues to inspire the next generation of inventors and shape the future of technology in Japan and beyond.

Latest Patents:

Inasaki's latest patents include a lithographic printing plate precursor and methods for producing lithographic printing plates. These patents showcase his expertise in developing advanced technologies that are revolutionizing the printing industry.

Career Highlights:

Throughout his illustrious career, Takeshi Inasaki has made significant contributions to companies like Fujifilm Corporation and Fujitsu Corporation. His dedication to innovation has led to the successful development of cutting-edge products and solutions that have had a profound impact on the industry.

Collaborations:

Inasaki has collaborated with esteemed colleagues such as Tomotaka Tsuchimura and Takayuki Ito, who have played a key role in bringing his innovative ideas to life. Together, they have worked tirelessly to push the boundaries of technology and create products that are shaping the future of the industry.

Conclusion:

Takeshi Inasaki's pioneering spirit and unwavering commitment to innovation have established him as a trailblazer in the field of technology. His remarkable achievements and groundbreaking inventions continue to inspire inventors around the world, cementing his legacy as a true visionary in the world of innovation.

If you need more information or have any other requests, feel free to ask!

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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