The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Aug. 05, 2014
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Takeshi Inasaki, Haibara-gun, JP;
Takeshi Kawabata, Haibara-gun, JP;
Tomotaka Tsuchimura, Haibara-gun, JP;
Toru Tsuchihashi, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 212/12 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01); C08F 212/14 (2006.01); C08F 12/22 (2006.01); C08F 12/24 (2006.01); C08F 8/02 (2006.01); C09D 125/18 (2006.01); G03F 1/00 (2012.01); G03F 7/00 (2006.01); C08F 261/02 (2006.01); C08F 12/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 8/02 (2013.01); C08F 12/22 (2013.01); C08F 12/24 (2013.01); C08F 212/14 (2013.01); C08F 261/02 (2013.01); C09D 125/18 (2013.01); G03F 1/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); C08F 12/30 (2013.01);
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, Mrepresents a single bond or a divalent linking group; Qrepresents an alkyl group, a cycloalkyl group, or an aryl group).