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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9285679 B1

PDFFull Text
Date of Patent:
Mar. 15, 2016

Filed:

Sep. 26, 2014

Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tomotaka Tsuchimura, Shizuoka, JP;

Takuya Tsuruta, Shizuoka, JP;

Takeshi Inasaki, Shizuoka, JP;

Koutarou Takahashi, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Anca Eoff

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/028 (2006.01); G03F 7/027 (2006.01); C08F 12/24 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 1/00 (2012.01); G03F 1/20 (2012.01); G03F 1/22 (2012.01); G03F 7/20 (2006.01); C08F 12/22 (2006.01); C08F 12/26 (2006.01); C08F 12/30 (2006.01); C08F 12/32 (2006.01); C08F 212/14 (2006.01); C09D 125/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C08F 12/22 (2013.01); C08F 12/24 (2013.01); C08F 12/26 (2013.01); C08F 12/30 (2013.01); C08F 12/32 (2013.01); C08F 212/14 (2013.01); C09D 125/18 (2013.01); G03F 1/00 (2013.01); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0388 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2037 (2013.01); G03F 7/2039 (2013.01);
Abstract

There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Åor more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein,

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