Fukuoka, Japan

Takashi Ikeda

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignees: Tokyo Electron Limited, Nippon Tungsten Co., Ltd., Panasonic Intellectual Property Managment Co., Ltd.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Ikeda. Retrieved from https://idiyas.com/inventor/takashi-ikeda-8b7acka3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 80.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Koshi, JP (2022 - 2023)
  • Fukuoka, JP (2022 - 2023)

Company Filing History:


Years Active: 2022-2026

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5 patents (USPTO):Explore Patents

Title: The Innovations of Takashi Ikeda

Introduction

Takashi Ikeda is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of substrate processing and plasma technology. With a total of four patents to his name, Ikeda's work reflects a commitment to advancing technology in his area of expertise.

Latest Patents

One of Ikeda's latest patents is a substrate liquid processing apparatus. This apparatus includes an inner tub that stores a processing liquid and an outer tub provided outside the inner tub. It features a first cover body that can move between a closing position and an opening position, as well as a second cover body with similar functionality. The design ensures that when the cover bodies are in the closing positions, their sidewalls closely face each other, maintaining a specific gap. Another significant patent is for a member used in a plasma processing apparatus, which consists of a tungsten carbide phase. This member includes atoms such as Fe, Co, and Ni, with their total content carefully measured in atomic ppm.

Career Highlights

Throughout his career, Takashi Ikeda has worked with prominent companies, including Tokyo Electron Limited and Nippon Tungsten Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Ikeda has collaborated with notable colleagues, including Hiroyuki Masutomi and Hajime Ishii. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Takashi Ikeda's contributions to the field of substrate processing and plasma technology are noteworthy. His innovative patents and collaborations highlight his dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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