Tokorozawa, Japan

Susumu Komoriya

This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Nanoimprint Lithography. Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation. Active years: 1980-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Susumu Komoriya. Retrieved from https://idiyas.com/inventor/susumu-komoriya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 65.0

Average Co-Inventor Count = 4.2

ph-index = 9

Forward Citations = 190(Granted Patents)


Location History:

  • Tachikawa, JP (1980 - 1981)
  • Ashigarakami-gun, JP (2011)
  • Saitama, JP (2012)
  • Kodama-gun, JP (2012)
  • Tokorozawa, JP (1987 - 2013)

Company Filing History:


Years Active: 1980-2013

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Areas of Expertise:
Pattern Transfer
Imprint Device
Nanoimprint Stamper
Thin Film Formation
Semiconductor Circuit
Exposure Method
Wafer Production
Microstructure Transfer
Photomask Alignment
Projection Aligner
Pattern Detection
20 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Susumu Komoriya**

Introduction

Susumu Komoriya, a distinguished inventor based in Tokorozawa, Japan, is renowned for his significant contributions to the field of pattern transfer methods and imprint devices. With a remarkable portfolio of 20 patents, Komoriya has made strides in developing techniques that enhance precision in manufacturing processes.

Latest Patents

Among his latest innovations, two notable patents stand out. The first is a **Pattern Transfer Method and Imprint Device** designed to achieve high accuracy when aligning a transferred object with a stamper. This method includes steps for detecting multiple edge positions of the transferred object, calculating arbitrary points from these positions, and adjusting the relative position accurately. The second is the **Pattern Forming Method and Its Mold**, which involves a mold with concentric alignment marks that assists in determining the relative position between a substrate and the mold. This method effectively excludes damaged marks from the alignment process, ensuring greater accuracy.

Career Highlights

Throughout his career, Komoriya has held significant positions at reputable companies, including Hitachi, Ltd. and Hitachi High-Technologies Corporation. His work at these institutions has allowed him to explore and develop innovative technologies, particularly in the fields of imprinting and pattern transfer, leading to his impressive list of patents.

Collaborations

Komoriya has collaborated with accomplished colleagues, notably Hiroshi Nishizuka and Hisashi Maejima. These collaborations have played a vital role in fostering an environment of innovation and enhancing the quality of the research and development processes within their projects.

Conclusion

Susumu Komoriya's inventive spirit and expertise have made significant impacts in the realm of pattern transfer and imprinting technologies. His continued work and dedication to innovation bode well for future advancements in this field, marking him as a pivotal figure in the world of patents and inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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