The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Jul. 06, 2007
Takashi Ando, Ibaraki, JP;
Susumu Komoriya, Saitama, JP;
Masahiko Ogino, Ibaraki, JP;
Akihiro Miyauchi, Ibaraki, JP;
Takashi Ando, Ibaraki, JP;
Susumu Komoriya, Saitama, JP;
Masahiko Ogino, Ibaraki, JP;
Akihiro Miyauchi, Ibaraki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.