The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Aug. 03, 2009
Kyoichi Mori, Kodama-gun, JP;
Noritake Shizawa, Kodama-gun, JP;
Susumu Komoriya, Kodama-gun, JP;
Akihiro Miyauchi, Hitachi, JP;
Takashi Ando, Hitachi, JP;
Tetsuhiro Hatogai, Chiyoda-ku, JP;
Kyoichi Mori, Kodama-gun, JP;
Noritake Shizawa, Kodama-gun, JP;
Susumu Komoriya, Kodama-gun, JP;
Akihiro Miyauchi, Hitachi, JP;
Takashi Ando, Hitachi, JP;
Tetsuhiro Hatogai, Chiyoda-ku, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A nanoimprint stamper can simultaneously conform to two types of anomaly in the shape of a transfer substrate, for example warpage and surface protrusions (including foreign objects) that differ greatly in the wavelength of variation. The nanoimprint stamper is capable of performing transfer with a smaller number of defects and in a uniform way. The nanoimprint stamper includes a light-transmitting rigid substrate, a light-transmitting resilient plate, a light-trarsmitting and flexible rigid stamper base, a light-transmitting stamper buffer layer, and a light-transmitting patterned stamp layer. The stamper buffer layer has a lower Young's modulus than the patterned stamp layer.