Sung-Yong Chung

Title: The Innovative Contributions of Sung-Yong Chung

Introduction

Sung-Yong Chung is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor devices, holding a total of 17 patents. His work has advanced the technology behind memory devices, showcasing his expertise and innovative spirit.

Latest Patents

One of Sung-Yong Chung's latest patents is titled "Gate fringing effect based channel formation for semiconductor device." This patent describes a memory device that includes a string of memory transistors, a source select transistor coupled to one end of the string, and a drain select transistor coupled to the other end. Each memory transistor features a gate electrode formed adjacent to a charge trapping layer, with no source or drain junctions between adjacent memory transistors or between the memory transistors and the select transistors. In one embodiment, the memory transistors are spaced apart, allowing channels to form based on the gate fringing effect associated with the memory transistors. Other embodiments of this technology are also described, highlighting the versatility and potential applications of his invention.

Career Highlights

Throughout his career, Sung-Yong Chung has worked with notable companies in the semiconductor industry, including Spansion LLC and Cypress Semiconductor Corporation. His experience in these organizations has contributed to his development as an inventor and has allowed him to collaborate with other talented professionals in the field.

Collaborations

Sung-Yong Chung has collaborated with several colleagues, including Zhizheng Liu and Yi He. These partnerships have fostered innovation and have played a crucial role in the advancement of semiconductor technology.

Conclusion

Sung-Yong Chung's contributions to the field of semiconductor devices are noteworthy and impactful. His innovative patents and collaborations reflect his dedication to advancing technology and improving memory devices. His work continues to influence the industry and inspire future innovations.