The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jul. 10, 2012
Bradley Marc Davis, Mountain View, CA (US);
Mark W. Randolph, San Jose, CA (US);
Sung-yong Chung, Davis, CA (US);
Hidehiko Shiraiwa, San Jose, CA (US);
Bradley Marc Davis, Mountain View, CA (US);
Mark W. Randolph, San Jose, CA (US);
Sung-Yong Chung, Davis, CA (US);
Hidehiko Shiraiwa, San Jose, CA (US);
CYPRESS SEMICONDUCTOR CORPORATION, San Jose, CA (US);
Abstract
Methods and systems of fabricating a wordline protection structure are described. As described, the wordline protection structure includes a polysilicon structure formed adjacent to a memory core region. The polysilicon structure includes first doped region positioned on a core side of the polysilicon structure and a second doped region positioned on a spine side of the polysilicon structure. An un-doped region positioned between the first and second doped regions. A conductive layer is formed on top of the polysilicon structure and arranged so that it does not contact the un-doped region at either the transition between the first doped region and the un-doped region or the second doped region and un-doped region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile