Hsin-Chu, Taiwan

Shwangming Jeng


Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 146(Granted Patents)


Location History:

  • Taiwan, TW (2001)
  • Hsin-Chin, TW (2001)
  • Hsin-Chiu, TW (2000 - 2002)
  • Hsin-chu, TW (2000 - 2002)

Company Filing History:


Years Active: 2000-2002

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14 patents (USPTO):Explore Patents

Title: Innovations of Shwangming Jeng

Introduction

Shwangming Jeng is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on addressing critical challenges in the manufacturing processes of semiconductor devices.

Latest Patents

One of Jeng's latest patents addresses the black diamond film delamination problem. Low k dielectrics, such as black diamond, often delaminate from the edges of silicon wafers, leading to various issues, including the blinding of alignment marks. Jeng's innovative solution involves inserting a layer of silicon nitride between the low k layer and the substrate. This layer must be under substantial compressive stress, specifically at least 5×10 dynes/cm. Additionally, when dealing with black diamond, a nucleating layer is inserted between the silicon nitride and the black diamond. The patent also describes a process for laying down these required layers, with an example of applying the invention to a dual damascene structure.

Another significant patent by Jeng outlines a method for cleaning a copper/porous low-k dual damascene etch. This method includes several steps, starting with providing a semiconductor structure that has an exposed device. An etch stop layer is formed over this structure, followed by a layer of low-k material. A patterned layer of photoresist is then created over the low-k material, which is used as a mask for etching. The process concludes with a low temperature ashing process and a low pressure, low bias etching process to clean the exposed underlying device.

Career Highlights

Shwangming Jeng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and contribute to advancements in semiconductor technology. His expertise and inventions have played a crucial role in improving manufacturing processes and device performance.

Collaborations

Jeng has collaborated with notable colleagues, including Syun-Ming Jang Jang and Chen-Hua Douglas Yu. These collaborations have further enhanced the impact of his work in the semiconductor industry.

Conclusion

Shwangming Jeng's contributions to semiconductor technology through his innovative patents demonstrate his commitment to solving complex challenges in the field. His work continues to influence the industry and pave the way for future advancements.

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