Kawasaki, Japan

Shuji Koyama

This inventor holds 83 USPTO granted patents and 4 EPO patents, primarily in Inkjet Technology (CPC class B41J2-05). Top assignee: Canon Kabushiki Kaisha. Active years: 1992-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuji Koyama. Retrieved from https://idiyas.com/inventor/shuji-koyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 51.8

 

Average Co-Inventor Count = 5.4

ph-index = 15

Forward Citations = 705(Granted Patents)

Forward Citations (Not Self Cited) = 619(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Hiratsuka, JP (1992)
  • Kanagawa-ken, JP (2003)
  • Kanagawa, JP (2003 - 2011)
  • Kawasaki, JP (1994 - 2017)

Company Filing History:


Years Active: 1992-2017

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Areas of Expertise:
Liquid Ejection Head
Inkjet Recording Head
Silicon Substrate
Manufacturing Method
Liquid Discharge Head
Ejection Orifice
Ink Supply Ports
Liquid Composition
Processing Method
Inkjet Cartridge
Substrate Production
Recording Head
83 patents (USPTO):Explore Patents

Title: **Shuji Koyama: Innovator in Semiconductor Technology**

Introduction

Shuji Koyama is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 83 patents, Koyama has been at the forefront of developing innovative techniques that enhance manufacturing processes and improve product quality.

Latest Patents

Among Koyama's latest inventions is a remarkable etching method for silicon substrates. This method utilizes a liquid composition that includes an alkaline organic compound, water, and a boron compound, with the boron content ranging from 1% to 14% by mass. The boron compound options include boron sesquioxide, sodium tetraborate, metaboric acid, sodium perborate, sodium borohydride, zinc borate, and ammonium borate, showcasing a versatile approach to semiconductor processing.

Another noteworthy patent involves the manufacturing of a liquid ejection head substrate. This process includes forming multiple recesses in a silicon wafer and etching it to create a depression along with several through holes. By dividing the silicon wafer based on these through holes, Koyama's method streamlines the production of liquid ejection head substrates, thereby enhancing efficiency in manufacturing.

Career Highlights

Shuji Koyama works at Canon Kabushiki Kaisha, a leading technology company renowned for its innovation in imaging and printing solutions. His work has significantly contributed to Canon’s advancements in semiconductor and electronic component technologies, making him a valued asset within the company.

Collaborations

Throughout his career, Koyama has collaborated with notable colleagues such as Toshio Kashino and Jun Yamamuro. Working alongside such talented individuals has fostered a collaborative environment that promotes groundbreaking innovations in semiconductor technology.

Conclusion

Shuji Koyama’s extensive experience and innovative mindset have resulted in valuable contributions to the semiconductor industry. His numerous patents reflect a commitment to enhancing manufacturing techniques and product performance. As he continues to develop new technologies, Koyama remains a significant figure in the realm of semiconductor innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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