The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Jul. 24, 2012
Applicants:
Hiroyuki Abo, Tokyo, JP;
Taichi Yonemoto, Isehara, JP;
Shuji Koyama, Kawasaki, JP;
Kenta Furusawa, Yokohama, JP;
Keisuke Kishimoto, Yokohama, JP;
Inventors:
Hiroyuki Abo, Tokyo, JP;
Taichi Yonemoto, Isehara, JP;
Shuji Koyama, Kawasaki, JP;
Kenta Furusawa, Yokohama, JP;
Keisuke Kishimoto, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract
A liquid composition used to carry out crystal anisotropic etching of a silicon substrate provided with an etching mask formed of a silicon oxide film with the silicon oxide film used as a mask includes cesium hydroxide, an alkaline organic compound, and water.