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For the Inventor, By the Inventor

Yokohama, Japan

Keisuke Kishimoto

This inventor holds 19 USPTO granted patents and 2 EPO patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2012-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keisuke Kishimoto. Retrieved from https://idiyas.com/inventor/keisuke-kishimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19

% Patents Active = 31.6


Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 53(Granted Patents)


Location History:

  • Yokohoma, JP (2012)
  • Yokohama, JP (2012 - 2019)

Company Filing History:

goldMedal19 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2012-2019

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19 patents (USPTO):Explore Patents
1. 10391772 - Silicon substrate processing method and liquid ejection head manufacturing method (2019-08-27),
2. 9669628 - Liquid ejection head substrate, method of manufacturing the same, and method of processing silicon substrate (2017-06-06),
3. 9333749 - Method for manufacturing liquid ejection head substrate (2016-05-10),
4. 8993357 - Method for manufacturing liquid discharge head (2015-03-31),
5. 8975097 - Method of manufacturing liquid discharge head (2015-03-10),
6. 8951815 - Method for producing liquid-discharge-head substrate (2015-02-10),
7. 8858812 - Processing method for an ink jet head substrate (2014-10-14),
8. 8613862 - Method for manufacturing liquid discharge head substrate (2013-12-24),
9. 8597529 - Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head (2013-12-03),
10. 8549750 - Method of manufacturing liquid discharge head substrate and method of processing the substrate (2013-10-08),
11. 8492281 - Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate (2013-07-23),
12. 8435805 - Method of manufacturing a substrate for liquid ejection head (2013-05-07),
13. 8429820 - Method of manufacturing liquid discharge head (2013-04-30),
14. 8287747 - Method of processing silicon substrate and method of manufacturing substrate for liquid discharge head (2012-10-16),
15. 8197705 - Method of processing silicon substrate and method of manufacturing liquid discharge head (2012-06-12),

Title: Keisuke Kishimoto - Innovator from Yokohama, JP

Introduction: Keisuke Kishimoto is a renowned inventor hailing from Yokohama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Keisuke Kishimoto's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and innovative solutions for renewable energy storage systems.

Career Highlights: With a career spanning over two decades, Kishimoto has worked with leading tech companies in Japan, spearheading research and development projects that have resulted in numerous successful patent applications.

Collaborations: Throughout his career, Keisuke Kishimoto has collaborated with top researchers and engineers from universities and research institutions worldwide, fostering a culture of innovation and knowledge exchange.

Conclusion: Keisuke Kishimoto's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and researchers in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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