Company Filing History:
Years Active: 2014-2017
Title: The Innovative Mind of Shu-Min Huang: A Pioneer in Semiconductor Technology
Introduction: Shu-Min Huang, an accomplished inventor based in Tainan, Taiwan, has made significant contributions to the field of semiconductor technology. With a portfolio of five patents, his work focuses on methodologies that enhance the fabrication processes and structures of semiconductor devices.
Latest Patents: Among Shu-Min Huang's latest patents is a groundbreaking method of forming a contact structure. This invention details a process involving a silicon-containing substrate topped with a composite dielectric layer, which includes the formation of a titanium nitride layer that interacts with the source/drain region, enhancing electrical performance. Another notable patent he has developed is a method for fabricating a semiconductor device. This method outlines steps to effectively remove nitride layers and a platinum-containing nickel-semiconductor compound layer using a specialized chemical solution, optimizing the fabrication process.
Career Highlights: Shu-Min Huang works with the esteemed company, United Microelectronics Corporation (UMC), where he applies his expertise to advance semiconductor manufacturing techniques. His innovative approaches to device fabrication and structure formation have not only expanded his own reputation but have also contributed immensely to the industry's evolution.
Collaborations: Throughout his career, Shu-Min Huang has collaborated with talented professionals such as Chia-Chang Hsu and Kuo-Chih Lai, collectively enhancing their working environment with innovative ideas and practical solutions in their field. These collaborations have significantly influenced the progress and success of various projects at UMC.
Conclusion: Shu-Min Huang exemplifies the spirit of innovation within the semiconductor industry. His patents reflect a deep understanding of material science and engineering, marking him as a key figure in advancing semiconductor technology. With continued dedication and collaboration, Huang's contributions will undoubtedly inspire future developments in this dynamic field.