The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Jul. 13, 2011
Yi-wei Chen, Taichung, TW;
Teng-chun Tsai, Tainan, TW;
Kuo-chih Lai, Tainan, TW;
Shu-min Huang, Tainan, TW;
Yi-Wei Chen, Taichung, TW;
Teng-Chun Tsai, Tainan, TW;
Kuo-Chih Lai, Tainan, TW;
Shu-Min Huang, Tainan, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A cleaning method of a semiconductor manufacturing process is provided. The cleaning method is applied to a semiconductor component including a plurality of material layers formed thereon. An opening is defined in the material layers, and a side wall is exposed from the opening. The side wall at least includes a first material layer and a second material layer. At first, a first cleaning process is performed till a lateral etched thickness of the first material layer is equal to a lateral etched thickness of the second material layer. Then, a byproduct formed in the first cleaning process is removed.