Location History:
- Nirasaki, JP (2008 - 2014)
- Yamanashi-Ken, JP (2009 - 2014)
- Yamanashi, JP (2014)
- Miyagi, JP (2014 - 2024)
Company Filing History:
23 out of 10,341 
4 out of 52,751 
2 out of 23 Years Active: 2008-2025
Title: The Innovative Journey of Shoichiro Matsuyama
Introduction: Shoichiro Matsuyama, based in Nirasaki, Japan, is a prolific inventor known for his significant contributions to the field of plasma processing technology. With an impressive portfolio of 23 patents, Matsuyama has made impactful advancements that have transformed the industry.
Latest Patents: Among his latest inventions is the Plasma Processing Apparatus and Processing Method. This state-of-the-art apparatus includes a chamber, a substrate support integrated within the chamber, and a bias power supply designed to deliver an electrical bias energy to an electrode of the substrate support. It features a matching box that comprises a matching circuit and a radio-frequency power supply, which adjusts the frequency of the radio-frequency power during various phase periods. Additionally, the invention integrates a sensor that monitors load impedance and a filter that removes intermodulation distortion components, ensuring optimal performance.
Another notable patent is the design of an Electrostatic Chuck, which consists of two distinct regions—a first region that supports a substrate and a second region that encircles the first, designed to hold a focus ring. This innovative structure allows for efficient plasma processing by maintaining the integrity of the substrate and the surrounding environment.
Career Highlights: Shoichiro Matsuyama has made significant strides in his career by working with prominent companies, including Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His expertise in plasma processing equipment has been pivotal in driving advancements in semiconductor manufacturing technologies.
Collaborations: Throughout his career, Matsuyama has collaborated with talented professionals, including Kazuya Nagaseki and Shinji Himori. These partnerships have facilitated the exchange of ideas and fostered innovation in their collective work, pushing the boundaries of what is possible in plasma processing technologies.
Conclusion: Shoichiro Matsuyama exemplifies the spirit of innovation through his numerous patents and contributions to the field of plasma processing. His work continues to influence the industry and inspire future generations of inventors. With a commitment to advancing technology, Matsuyama remains a key figure in the ongoing evolution of semiconductor applications.