The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Feb. 14, 2012
Applicant:
Shoichiro Matsuyama, Miyagi, JP;
Inventor:
Shoichiro Matsuyama, Miyagi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Plasma uniformity can be improved. An upper electrodefor use in a parallel plate type plasma processing apparatus includes a basemade of a dielectric material; and a conductive layerformed on at least a part of a surface of the basefacing a lower electrodeprovided in the plasma processing apparatus. Further, the conductive layerhaving a dense and sparse pattern such that the dense and sparse pattern at an outer portion of the surface of the basefacing the lower electrodeis denser than at an inner portion thereof.