Atsugi, Japan

Shohei Koizumi

USPTO Granted Patents = 11 

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Atsugi, JP (2016 - 2022)
  • Tokyo, JP (2022)

Company Filing History:


Years Active: 2016-2022

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11 patents (USPTO):Explore Patents

Title: Innovations of Shohei Koizumi

Introduction

Shohei Koizumi is a prominent inventor based in Atsugi, Japan. He has made significant contributions to the field of transistor manufacturing, holding a total of 11 patents. His work is recognized for its innovative approaches to improving the efficiency and effectiveness of transistor production.

Latest Patents

Koizumi's latest patents include a method for manufacturing a transistor that involves the removal of an oxide film. This method provides a detailed process for creating a bottom-gate transistor, which includes several steps such as forming a first metal layer on an insulator layer, applying a resist, and patterning the first metal layer using photolithography. Another notable patent is a comprehensive transistor manufacturing method that outlines the formation of source and drain electrodes, as well as a gate electrode, utilizing advanced techniques like electroless plating.

Career Highlights

Throughout his career, Koizumi has been associated with Nikon Corporation, a leading company in imaging and optical products. His work has significantly advanced the technology behind transistors, making him a key figure in the industry.

Collaborations

Koizumi has collaborated with talented coworkers such as Takashi Sugizaki and Yusuke Kawakami. Their combined expertise has contributed to the successful development of innovative technologies in the field of electronics.

Conclusion

Shohei Koizumi's contributions to transistor manufacturing highlight his role as a leading inventor in the industry. His innovative methods and patents continue to influence the development of advanced electronic components.

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