Location History:
- Sagamihara, JP (1995 - 1998)
- Hiratsuka, JP (2004 - 2007)
- Omura, JP (2011)
- Kanagawa, JP (2010 - 2013)
Company Filing History:
4 out of 87 
2 out of 142 
1 out of 1 Years Active: 1995-2013
Title: Shiro Yoshino: Innovator in Silicon Wafer Technology
Introduction
Shiro Yoshino is a prominent inventor known for his significant contributions to the field of semiconductor technology. He is based in Kanagawa, Japan, and holds a total of eight patents. His work primarily focuses on the heat treatment of silicon wafers, which are essential components in semiconductor devices.
Latest Patents
Yoshino's latest patents include a method for heat treatment of silicon wafers that minimizes slip dislocations. This innovative approach involves determining specific heat treatment conditions that prevent these dislocations from occurring. The resistance of the silicon wafer is calculated using a formula that predicts slip resistance based on various factors, including the density and size of oxygen precipitation within the wafer. Additionally, he has developed methods for predicting the precipitation behavior of oxygen in silicon single crystals, as well as determining production parameters for these crystals. His work also includes a storage medium for programs that predict oxygen precipitation behavior during the heat treatment process.
Career Highlights
Throughout his career, Shiro Yoshino has worked with notable companies such as Sumco Techxiv Corporation and Komatsu Electronic Metals Co., Ltd. His expertise in silicon wafer technology has made him a valuable asset in the semiconductor industry.
Collaborations
Yoshino has collaborated with esteemed colleagues, including Shinya Sadohara and Kozo Nakamura, to advance research and development in silicon wafer technology.
Conclusion
Shiro Yoshino's innovative work in silicon wafer technology has significantly impacted the semiconductor industry. His patents and collaborations reflect his dedication to advancing this critical field.