Shinya Okuda

Title: Shinya Okuda: Innovator in Semiconductor Technology

Introduction

Shinya Okuda is a prominent inventor based in Oita, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents, Okuda has developed a semiconductor device with a multilayer insulating layer in a recess and a method for manufacturing it. This innovative device features a stacking part where multiple conductor layers are stacked in a z direction, alongside a stair part that extends in a stair shape. The design includes a first insulating film and a second insulating film, with the latter having a higher linear expansion coefficient than the former. Another notable patent involves a semiconductor device that includes a first insulator made of silicon and oxygen, along with interconnects and insulators that incorporate carbon and nitrogen, ensuring optimal performance.

Career Highlights

Throughout his career, Shinya Okuda has worked with leading companies in the semiconductor industry, including Toshiba Memory Corporation and Kioxia Corporation. His expertise and innovative approach have positioned him as a key figure in the development of advanced semiconductor technologies.

Collaborations

Okuda has collaborated with notable colleagues such as Kei Watanabe and Takeshi Ishizaki, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion

Shinya Okuda's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the development of advanced electronic devices.