Miyagi, Japan

Shinya Morikita

USPTO Granted Patents = 24 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2008 - 2009)
  • Beaverton, OR (US) (2016)
  • Miyagi, JP (2019 - 2023)

Company Filing History:


Years Active: 2008-2025

where 'Filed Patents' based on already Granted Patents

24 patents (USPTO):

Title: Shinya Morikita: Innovator in Plasma Processing Technology

Introduction

Shinya Morikita, based in Miyagi, Japan, is recognized for his significant contributions to the field of plasma processing technology, holding a total of 20 patents. His innovative approaches have had a tangible impact on the industry, reflecting his commitment to advancing technological solutions.

Latest Patents

Among Morikita's latest patents is a novel treatment method. This method includes an embedding step where an organic film is embedded in an undercoat film that has a depression formed within it. The process continues with an etching step aimed at exposing at least a portion of the top of the undercoat film, indicating a sophisticated integration of materials in semiconductor manufacturing.

Another important patent pertains to an apparatus and method for plasma processing. This apparatus is specifically designed to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode. This process enhances plasma processing on substrates and aids in plasma cleaning. Notably, the duty ratio of the voltage applied during plasma processing is less than that used for plasma cleaning, showcasing an innovative way to optimize performance across different applications.

Career Highlights

Shinya Morikita is currently employed at Tokyo Electron Limited, a prominent company in the semiconductor and electronics sector. His work in this organization continues to set new standards and improve processes in plasma technology, contributing to the advancement of manufacturing techniques in high-tech industries.

Collaborations

Morikita collaborates with esteemed colleagues such as Toshikatsu Tobana and Takanori Banse. Together, they form a dynamic team that drives innovation and enhances the research and development initiatives within their field. Their collaborative efforts further exemplify the power of teamwork in technological advancements.

Conclusion

In conclusion, Shinya Morikita stands out as a leading inventor in the realm of plasma processing technology. His innovative patents and collaborative spirit contribute significantly to the semiconductor industry, particularly through his work at Tokyo Electron Limited. Morikita's dedication to pushing the boundaries of technology indicates a promising future filled with potential advancements.

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