The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
Feb. 13, 2020
Tokyo Electron Limited, Tokyo, JP;
Yusuke Aoki, Miyagi, JP;
Fumiya Takata, Miyagi, JP;
Toshikatsu Tobana, Miyagi, JP;
Shinya Morikita, Miyagi, JP;
Kazunobu Fujiwara, Miyagi, JP;
Jun Abe, Miyagi, JP;
Koichi Nagami, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.