Miyagi, Japan

Kazunobu Fujiwara


Average Co-Inventor Count = 6.5

ph-index = 2

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2020-2023

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5 patents (USPTO):

Title: Kazunobu Fujiwara: Innovator in Plasma Processing Technology

Introduction

Kazunobu Fujiwara is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work focuses on developing advanced methods and apparatuses for plasma processing, which are essential in various industrial applications.

Latest Patents

Fujiwara's latest patents include an "Apparatus and method for plasma processing." This innovative apparatus is designed to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode. This process is crucial for plasma processing on substrates and for plasma cleaning. Notably, the duty ratio of the pulsed negative DC voltage used for plasma processing is smaller than that used for plasma cleaning. Additionally, the average output voltage of the DC power supply for plasma processing is lower than that for plasma cleaning.

Another significant patent is the "Plasma processing method and plasma processing apparatus." This method involves generating plasma from a film formation gas within a chamber by supplying radio frequency power. It also includes forming a protective film on the inner wall surface of the chamber's side wall by depositing chemical species from the plasma. A pulsed negative direct-current voltage is periodically applied to the upper electrode during this process.

Career Highlights

Kazunobu Fujiwara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His expertise in plasma processing has positioned him as a key figure in the development of innovative technologies that enhance manufacturing processes.

Collaborations

Fujiwara has collaborated with notable colleagues, including Koichi Nagami and Tatsuro Ohshita. Their combined efforts have contributed to advancements in plasma processing technologies and have fostered a collaborative environment for innovation.

Conclusion

Kazunobu Fujiwara's contributions to plasma processing technology exemplify his dedication to innovation and excellence in the field. His patents and work at Tokyo Electron Limited continue to influence the industry and pave the way for future advancements.

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