Location History:
- Kitaibaraki, JP (2012)
- Ibaraki, JP (2015 - 2024)
Company Filing History:
10 out of 481 
1 out of 41 
1 out of 1 Years Active: 2012-2024
Title: The Innovative Contributions of Shinichiro Senda
Introduction
Shinichiro Senda is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets used in thin film deposition. With a total of 12 patents to his name, Senda's work has had a substantial impact on the manufacturing processes in various industries.
Latest Patents
One of Senda's latest patents is for a tungsten sputtering target. This invention provides a film deposition rate with less fluctuation over the target's life. The tungsten sputtering target features an area ratio of crystal grains with {100}, {110}, and {111} planes oriented to the sputtering surface of 30% or less. Additionally, the total area ratio of crystal grains with orientation planes other than {100}, {110}, and {111} is 46% or more. This ratio is determined through an analysis of a cross-section perpendicular to the sputtering surface using electron backscatter diffraction.
Another notable patent is for a tantalum sputtering target and its production method. This tantalum target is designed so that when observed via an electron backscatter diffraction pattern method, the area ratio of crystal grains with a {100} plane oriented in the normal direction is 30% or more. The goal of this invention is to provide a tantalum sputtering target that allows for appropriate control of the deposition rate under high-power sputtering conditions. This innovation enables the formation of thin films with superior thickness uniformity, enhancing productivity in the thin film formation process, especially for micro wiring applications.
Career Highlights
Shinichiro Senda has worked with notable companies in the industry, including JX Nippon Mining & Metals Corporation and JX Metals Corporation. His experience in these organizations has contributed to his expertise in materials science and engineering.
Collaborations
Senda has collaborated with several professionals in his field, including Kotaro Nagatsu and Atsushi Fukushima. These collaborations have likely fostered innovation and the exchange of ideas, further enhancing the quality of his work.
Conclusion
Shinichiro Senda's contributions to the field of sputtering targets have significantly advanced the technology used in thin film deposition. His innovative patents and collaborations reflect his commitment to improving manufacturing processes. Senda's work