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For the Inventor, By the Inventor

Yokohama, Japan

Shinichi Nitta

This inventor holds 14 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2003-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Nitta. Retrieved from https://idiyas.com/inventor/shinichi-nitta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14

% Patents Active = 21.4

Average Co-Inventor Count = 5.4

ph-index = 7

Forward Citations = 163(Granted Patents)


Location History:

  • Tokyo, JP (2004)
  • Kanagawa-ken, JP (2006)
  • Yokohama, JP (2003 - 2010)

Company Filing History:

goldMedal14 out of 53,250 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2003-2010

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14 patents (USPTO):Explore Patents
1. 7700381 - Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them (2010-04-20),
2. 7510945 - Element formation substrate, method of manufacturing the same, and semiconductor device (2009-03-31),
3. 7439112 - Semiconductor device using partial SOI substrate and manufacturing method thereof (2008-10-21),
4. 7420249 - Semiconductor device formed in semiconductor layer arranged on substrate with one of insulating film and cavity interposed between the substrate and the semiconductor layer (2008-09-02),
5. 7285825 - Element formation substrate for forming semiconductor device (2007-10-23),
6. 7148543 - Semiconductor chip which combines bulk and SOI regions and separates same with plural isolation regions (2006-12-12),
7. 7112822 - Semiconductor device using partial SOI substrate and manufacturing method thereof (2006-09-26),
8. 7057259 - Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them (2006-06-06),
9. 7019365 - Semiconductor device formed in semiconductor layer arranged on substrate with one of insulating film and cavity interposed between the substrate and the semiconductor layer (2006-03-28),
10. 7018904 - Semiconductor chip having multiple functional blocks integrated in a single chip and method for fabricating the same (2006-03-28),
11. 6906384 - Semiconductor device having one of patterned SOI and SON structure (2005-06-14),
12. 6855976 - Semiconductor device using partial SOI substrate and manufacturing method thereof (2005-02-15),
13. 6835981 - Semiconductor chip which combines bulk and SOI regions and separates same with plural isolation regions (2004-12-28),
14. 6630714 - Semiconductor device formed in semiconductor layer arranged on substrate with one of insulating film and cavity interposed between the substrate and the semiconductor layer (2003-10-07),

Title: The Innovative Mind of Shinichi Nitta

Introduction

Shinichi Nitta is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 14 patents, Nitta has demonstrated a strong commitment to advancing innovation in the electronics industry.

Latest Patents

Among his latest inventions are two groundbreaking patents:

1. **Semiconductor Wafer with ID Mark, Equipment for and Method of Manufacturing Semiconductor Device from Them** - This patent describes a semiconductor wafer featuring a bevel contour along its periphery. The wafer not only improves the manufacturing process but also includes an ID mark that provides critical information about the properties, manufacturing conditions, and test results of the products formed on the wafer.

2. **Element Formation Substrate, Method of Manufacturing the Same, and Semiconductor Device** - This innovation involves a complex methodology of bonding two substrates with thermal oxide films, etching processes, and the formation of a single-crystal semiconductor layer. This patent reflects Nitta's expertise in optimizing semiconductor device manufacturing.

Career Highlights

Shinichi Nitta currently works with Kabushiki Kaisha Toshiba, where he applies his knowledge and experience to drive advancements in semiconductor technology. His work has not only reinforced Toshiba's position as a leader in the industry but has also contributed to the wider technological landscape.

Collaborations

Nitta has collaborated with notable colleagues Hajime Nagano and Ichiro Mizushima, further enhancing the innovative culture within his team. Together, they share insights and technical expertise that facilitate the development of cutting-edge semiconductor solutions.

Conclusion

In conclusion, Shinichi Nitta's innovative contributions and patent portfolio exemplify the essential role of inventors in the evolution of technology. His work at Kabushiki Kaisha Toshiba and collaborations with esteemed colleagues highlight a commitment to excellence in semiconductor research and development. As technology continues to advance, the impact of Nitta's inventions will likely be felt for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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