Chu-Pei, Taiwan

Shin-Rung Lu


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 25(Granted Patents)


Location History:

  • Hsin-Chu, TW (2005)
  • Chu-Bei, TW (2009)
  • Chu-Pei, TW (2010 - 2017)

Company Filing History:


Years Active: 2005-2017

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13 patents (USPTO):

Title: **The Innovative Mind of Shin-Rung Lu: A Leader in Lithography Technology**

Introduction:

Shin-Rung Lu, based in Chu-Pei, Taiwan, is a prominent inventor with a remarkable portfolio of 13 patents. His contributions significantly impact the semiconductor manufacturing industry, specifically in lithography processes, enhancing precision and efficiency.

Latest Patents:

One of Lu's latest innovations is an **Intra-field process control for lithography**. This invention comprises a sophisticated method and system for controlling processes within a lithography tool. It involves transferring a reference pattern to the exposure fields of a reference workpiece, allowing for the formation of overlapping reference layers. By measuring misalignment between these layers, baseline maps are created, leading to the development of a final production map that optimally updates the parameters of the process tool.

Another noteworthy patent is **Lithographic overlay sampling**, which introduces a method for alignment by defining multiple fields on a wafer. This innovation organizes these fields into both orthogonal and continuous structures, improving alignment accuracy through precise measurements of alignment structure positions. This method enhances the integrity of features and layers during the lithographic process.

Career Highlights:

Shin-Rung Lu has achieved significant milestones in his career while working at Taiwan Semiconductor Manufacturing Company Limited (TSMC). His expertise and innovative approach have played a crucial role in advancing lithography technology, making substantial contributions to the optimization of semiconductor processes.

Collaborations:

Throughout his career, Lu has collaborated with other esteemed professionals in the field, including coworkers such as Yen-Di Tsen and Jong-I Mou. These collaborations have fostered a creative environment that encourages the sharing of ideas and insights, ultimately leading to groundbreaking advancements in their projects.

Conclusion:

Shin-Rung Lu's dedication to innovation and his impressive collection of patents position him as a key figure in lithography technology. His work not only enhances the capabilities of semiconductor manufacturing but also sets the stage for future innovations in the industry.

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