Shiliang Ji

Title: Shiliang Ji: Innovator in Semiconductor Technology

Introduction

Shiliang Ji is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on innovative semiconductor structures and methods that enhance performance and efficiency.

Latest Patents

One of Shiliang Ji's latest patents is titled "Semiconductor structure and method of forming semiconductor structure." This invention describes a semiconductor structure that includes a substrate, a first isolation structure, and both a first and second nanostructure positioned on either side of the first isolation structure. Additionally, the structure features a second isolation structure, along with a third and fourth nanostructure on either side of it. Notably, the top of the second isolation structure is lower than that of the first. The design also incorporates a first and second gate structure that expose the top surface of the first isolation structure, as well as a third and fourth gate structure that are in contact on the top surface of the second isolation structure.

Career Highlights

Shiliang Ji has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Semiconductor Manufacturing International Corporation in Beijing. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Some of Shiliang Ji's coworkers include Haiyang Zhang and Jun Yang. Their collaboration has likely contributed to the advancement of semiconductor technologies within their respective projects.

Conclusion

Shiliang Ji's contributions to semiconductor technology through his patents and career experiences highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor structures and methods.