The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Apr. 21, 2023
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Abstract
A semiconductor structure includes: a substrate; channel structures on the substrate, a channel structure of the channel structures including a plurality of channel layers stacked along a direction perpendicular to a surface of the substrate and a plurality of gate grooves between adjacent channel layers; gate structures spanning the channel structure, the gate structures being also in the plurality of gate grooves; source/drain regions on the substrate on two sides of the gates and the channel layers, the source/drain regions being in contact with sidewalls of a plurality of channel layers; and inner spacer layers between adjacent channel layers, and first dielectric layers between the inner spacer layers and the gate structures, the inner spacer layers being between the source/drain regions and the gate structures.