Kawasaki, Japan

Shigeo Satoh

This inventor holds 22 USPTO granted patents, primarily in Semiconductor Devices. Top assignees: Fujitsu Semiconductor Limited, Fujitsu Corporation, Fujitsu Microelectronics Limited. Active years: 2006-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeo Satoh. Retrieved from https://idiyas.com/inventor/shigeo-satoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 27.3

Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 96(Granted Patents)


Location History:

  • Kanagawa, JP (2010)
  • Kawasaki, JP (2006 - 2013)
  • Kunitachi, JP (2013 - 2014)
  • Yokohama, JP (2012 - 2015)

Company Filing History:


Years Active: 2006-2015

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Areas of Expertise:
Semiconductor Device
Manufacturing Method
LDMOS Transistor
Strain Effects
CMOS Integrated Circuit
Stressor Film
Device Characteristics
Resistor Element
Active Region
Stressing Surface
Dummy Active Region
22 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology: The Contributions of Shigeo Satoh

Introduction: Shigeo Satoh is a prominent inventor based in Kawasaki, Japan, with a notable portfolio comprising 22 patents. His work primarily revolves around semiconductor devices, where he has contributed significantly to advancements in the manufacturing processes and efficiencies of electronic components.

Latest Patents: Satoh's latest innovations include two key patents that focus on enhancing semiconductor device functionality. The first patent, titled "Semiconductor Device and Method of Manufacturing Same," outlines a novel design featuring a first transistor and a second transistor with differentiated dimensions in their sidewall spacers and source/drain regions. This inventive approach aims to optimize area ratios, contributing to improved device performance. The second patent, simply titled "Semiconductor Device," describes a detailed configuration involving a silicon substrate with multiple regions, gate electrode structures, insulation films, and electrically conductive vias. This comprehensive setup is designed to enhance the efficiency and stability of semiconductor operations.

Career Highlights: Shigeo Satoh has held substantial roles in esteemed organizations, including Fujitsu Semiconductor Limited and Fujitsu Corporation. His experience in these companies has allowed him to contribute to critical developments in semiconductor technology, as well as to refine manufacturing methods that benefit the industry as a whole.

Collaborations: Throughout his career, Satoh has worked alongside talented professionals, including Kaina Suzuki and Akihiro Usujima. These collaborations have facilitated the exchange of innovative ideas and fostered improvements in semiconductor engineering practices.

Conclusion: Shigeo Satoh's contributions to the semiconductor industry reflect his commitment to innovation and excellence. With a growing list of patents and a solid career foundation, he continues to impact the field significantly, demonstrating the vital role inventors play in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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