Company Filing History:

10 out of 131,611

Samsung Electronics Co., Ltd.

where one patent can have more than one assignee

Years Active: 2009-2019

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10242880 - Method of wet etching and method of fabricating semiconductor device using the same (2019-03-26),

2. 9972638 - Methods of fabricating three-dimensional semiconductor devices (2018-05-15),

3. 9368647 - Compositions for etching (2016-06-14),

4. 9136120 - Compositions for etching and methods of forming a semiconductor device using the same (2015-09-15),

5. 8963231 - Three dimensional semiconductor memory devices and methods of fabricating the same (2015-02-24),

6. 8940182 - Compositions for etching and methods of forming a semiconductor device using the same (2015-01-27),

7. 8765551 - Non-volatile memory device having vertical structure and method of manufacturing the same (2014-07-01),

8. 8685821 - Vertical channel memory devices with nonuniform gate electrodes and methods of fabricating the same (2014-04-01),

9. 8552489 - Vertical channel memory devices with nonuniform gate electrodes (2013-10-08),

10. 7527921 - Method of treating and removing a photoresist pattern and method of manufacturing a semiconductor device using the same (2009-05-05),

Title: Se-Ho Cha: Innovator in Semiconductor Technology

Introduction

Se-Ho Cha is a prominent inventor based in Goyang-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His innovative approaches have advanced the methods used in semiconductor fabrication and etching processes.

Latest Patents

Among his latest patents, Se-Ho Cha has developed a method of wet etching and a method of fabricating semiconductor devices. The wet etching method involves providing a wafer in a process bath containing an etchant. This method includes supplying the process bath with a primary etchant to control the concentration of a specific material in the etchant. Additionally, it involves supplying the process bath with a first additive to increase the concentration of the specific material and a second additive to suppress defects caused by this increase. The etchant comprises at least one of the primary etchant, the first additive, and the second additive, which are supplied separately to the process bath. Furthermore, he has also patented methods for fabricating three-dimensional semiconductor devices. This method entails alternately stacking sacrificial layers and insulating layers on a substrate, forming a cutting region that penetrates the uppermost sacrificial layer, and filling this region with a non-sacrificial layer. The resulting mold pattern includes insulating patterns, sacrificial patterns, and the non-sacrificial layer in the cutting region.

Career Highlights

Se-Ho Cha has worked with notable companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Soulbrain Co., Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Throughout his career, Se-Ho Cha has collaborated with talented individuals such as Kyunghyun Kim and Daehong Eom. These collaborations have likely fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Se-Ho Cha's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor fabrication and etching processes.

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