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Dresden, Germany

Scott Luning

USPTO Granted Patents = 20

Average Co-Inventor Count = 2.5

ph-index = 8

Forward Citations = 358(Granted Patents)

Location History:

San Francisco, CA (US) (1999 - 2003)
Dresden, DE (2004 - 2007)
Poughkeepie, NY (US) (2007)

Company Filing History:

20 out of 12,883

Advanced Micro Devices Corporation

Years Active: 1999-2007

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20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7279389 - Technique for forming a transistor having raised drain and source regions with a tri-layer hard mask for gate patterning (2007-10-09),

2. 7183169 - Method and arrangement for reducing source/drain resistance with epitaxial growth (2007-02-27),

3. 7176110 - Technique for forming transistors having raised drain and source regions with different heights (2007-02-13),

4. 7144786 - Technique for forming a transistor having raised drain and source regions with a reduced number of process steps (2006-12-05),

5. 6821853 - Differential implant oxide process (2004-11-23),

6. 6806126 - Method of manufacturing a semiconductor component (2004-10-19),

7. 6777281 - Maintaining LDD series resistance of MOS transistors by retarding dopant segregation (2004-08-17),

8. 6642134 - Semiconductor processing employing a semiconductor spacer (2003-11-04),

9. 6440819 - Method for differential trenching in conjunction with differential fieldox growth (2002-08-27),

10. 6410956 - Method and system for using a spacer to offset implant damage and reduce lateral diffusion in flash memory devices (2002-06-25),

11. 6387755 - Method and system for providing localized gate edge rounding with minimal encroachment and gate edge lifting (2002-05-14),

12. 6351013 - Low-K sub spacer pocket formation for gate capacitance reduction (2002-02-26),

13. 6232166 - CMOS processing employing zero degree halo implant for P-channel transistor (2001-05-15),

14. 6180468 - Very low thermal budget channel implant process for semiconductors (2001-01-30),

15. 6117719 - Oxide spacers as solid sources for gallium dopant introduction (2000-09-12),

Title: Scott Luning - Innovative Inventor from Dresden

Introduction: Scott Luning is a renowned inventor based in Dresden, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Scott Luning holds several patents in the areas of renewable energy, sustainable materials, and advanced robotics, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a career spanning over two decades, Scott Luning has worked with leading research institutions and tech companies, developing cutting-edge solutions that have revolutionized industries worldwide.

Collaborations: Throughout his career, Scott Luning has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Scott Luning's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

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