IDiyas

For the Inventor, By the Inventor

Hillsboro, OR, United States of America

Saurabh Morarka

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 5.8

ph-index = 1


Company Filing History:

goldMedal9 out of 54,664 
 
Intel Corporation
 patents
silverMedal2 out of 9 
 
Daedalus Prime LLC
 patents

Years Active: 2019-2025

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11 patents (USPTO):
1. 12457778 - Conductive contacts wrapped around epitaxial source or drain regions (2025-10-28),
2. 12382721 - Integrated circuit structures having cut metal gates with dielectric spacer fill (2025-08-05),
3. 11961836 - FinFET varactor quality factor improvement (2024-04-16),
4. 11869987 - Gate-all-around integrated circuit structures including varactors (2024-01-09),
5. 11610995 - Methods of forming dislocation enhanced strain in NMOS and PMOS structures (2023-03-21),
6. 11515424 - Field-effect transistors with asymmetric gate stacks (2022-11-29),
7. 11482618 - Methods of forming dislocation enhanced strain in NMOS and PMOS structures (2022-10-25),
8. 11417781 - Gate-all-around integrated circuit structures including varactors (2022-08-16),
9. 11411110 - Methods of forming dislocation enhanced strain in NMOS and PMOS structures (2022-08-09),
10. 11107920 - Methods of forming dislocation enhanced strain in NMOS structures (2021-08-31),
11. 10396201 - Methods of forming dislocation enhanced strain in NMOS structures (2019-08-27),

Title: Saurabh Morarka: Innovator in Integrated Circuit Technology

Introduction

Saurabh Morarka is a prominent inventor based in Hillsboro, Oregon, with a notable portfolio of 10 patents. His work primarily focuses on advancements in integrated circuit technology, showcasing his commitment to innovation in the electronics field.

Latest Patents

Among Morarka's latest patents is a pioneering design for integrated circuit structures characterized by cut metal gates with dielectric spacer fill. This groundbreaking innovation includes a first and second vertical arrangement of horizontal nanowires, enhancing the performance of integrated circuits. His other notable patent, the FinFET varactor quality factor improvement, presents a sophisticated integrated circuit structure comprising fins extending above a substrate, aimed at optimizing electronic performance.

Career Highlights

Over the years, Saurabh Morarka has contributed to several esteemed organizations, including Intel Corporation and Daedalus Prime LLC. His work at these companies has significantly influenced the development of cutting-edge technology in the semiconductor industry.

Collaborations

During his career, Morarka has collaborated with notable professionals in the field, including Michael J. Jackson and Anand S. Murthy. These partnerships have fostered innovation and the sharing of ideas, propelling advancements in integrated circuit design.

Conclusion

Saurabh Morarka's contributions to integrated circuit technology are significant. His patents and collaborations reflect a dedication to innovation that continues to shape the future of electronics. As he progresses in his career, the industry can anticipate further advancements from this inspiring inventor.

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