South San Francisco, CA, United States of America

Saurabh J Ullal

USPTO Granted Patents = 20 

Average Co-Inventor Count = 4.4

ph-index = 9

Forward Citations = 231(Granted Patents)


Location History:

  • Berkeley, CA (US) (2004 - 2010)
  • San Francisco, CA (US) (2014)
  • South San Francisco, CA (US) (2007 - 2015)
  • Union City, CA (US) (2011 - 2017)

Company Filing History:


Years Active: 2004-2017

where 'Filed Patents' based on already Granted Patents

20 patents (USPTO):

Title: Innovations by Saurabh J. Ullal: A Leader in Plasma Processing Technology

Introduction

Saurabh J. Ullal, based in South San Francisco, CA, is an accomplished inventor with a remarkable portfolio of 20 patents. His work primarily focuses on advancements in plasma processing technology, contributing significantly to the industry through innovative solutions designed to improve efficiency and effectiveness.

Latest Patents

Among his latest patents are groundbreaking inventions aimed at enhancing plasma processing chambers. One such patent addresses the issue of parasitic plasma in voids within these chambers. The invention proposes a method to eliminate parasitic plasma by covering electrically conductive surfaces inside the voids with a sleeve. These voids, which can include gas holes, lift pin holes, and helium passages, are critical components in chamber parts like the upper electrode and substrate support.

Another notable patent is for a showerhead electrode assembly designed for plasma processing apparatuses. This assembly includes a unique configuration of first and second members that house gas passages in fluid communication. This design optimizes pressure distribution, ensuring that a greater fraction of the total pressure drop occurs across the second gas passages compared to the first, thereby enhancing the longevity of the electrode assembly.

Career Highlights

Saurabh J. Ullal has made remarkable contributions to his field through his work at Lam Research Corporation. His innovative mindset and dedication to research have positioned him as a key player in the development of cutting-edge technologies. His patents demonstrate a deep understanding of plasma processing challenges and an advanced approach to solving them.

Collaborations

Throughout his career, Saurabh has collaborated with talented professionals, including his coworkers Harmeet Singh and Anthony de la Llera. These collaborations have fostered an environment of innovation and learning, leading to successful advancements in their respective projects.

Conclusion

Saurabh J. Ullal’s contributions to plasma processing technology through his patents have established him as a significant figure in the field. His innovative solutions not only improve current technologies but also pave the way for future advancements. As Saurabh continues to work within Lam Research Corporation, the impact of his inventions will likely resonate throughout the industry for years to come.

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