The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Jul. 27, 2010
Applicants:
Anthony Ricci, Sunnyvale, CA (US);
Saurabh Ullal, Union City, CA (US);
Larry Martinez, Gilroy, CA (US);
Inventors:
Anthony Ricci, Sunnyvale, CA (US);
Saurabh Ullal, Union City, CA (US);
Larry Martinez, Gilroy, CA (US);
Assignee:
LAM RESEARCH CORPORATION, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); C23C 16/4404 (2013.01); H01J 37/32477 (2013.01); H01J 37/32798 (2013.01); H01L 21/6833 (2013.01); Y10T 156/10 (2015.01);
Abstract
Parasitic plasma in voids in a component of a plasma processing chamber can be eliminated by covering electrically conductive surfaces in an interior of the voids with a sleeve. The voids can be gas holes, lift pin holes, helium passages, conduits and/or plenums in chamber components such as an upper electrode and a substrate support.