The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Sep. 10, 2009
John C. Valcore, Jr., San Jose, CA (US);
Saurabh Ullal, San Francisco, CA (US);
Daniel Byun, Newark, CA (US);
Ed Santos, San Jose, CA (US);
Konstantin Makhratchev, Fremont, CA (US);
John C. Valcore, Jr., San Jose, CA (US);
Saurabh Ullal, San Francisco, CA (US);
Daniel Byun, Newark, CA (US);
Ed Santos, San Jose, CA (US);
Konstantin Makhratchev, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for optimizing a dechuck sequence, which includes removing a substrate from a lower electrode. The method includes performing an initial analysis to determine if a first set of electrical characteristic data of a plasma formed during the dechuck sequence traverses a threshold values. If so, turning off the inert gas. The method also includes raising the lifter pins slightly from the lower electrode to move the substrate in an upward direction. The method further includes performing a mechanical and electrical analysis, which includes comparing a first set of mechanical data, which includes an amount of force exerted by the lifter pins, against a threshold value. The mechanical and electrical analysis also includes comparing a second set of electrical characteristic data against a threshold value. If both traverse the respective threshold value, removes the substrate from the lower electrode since a substrate-released event has occurred.