San Jose, CA, United States of America

Ed Santos

This inventor holds 2 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2013-2014.


% Patents Active = 50.0

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Ed Santos: Innovator in Plasma Technology

Introduction

Ed Santos is a notable inventor based in San Jose, CA, who has made significant contributions to the field of plasma technology. With a total of 2 patents to his name, Santos has developed innovative methods that enhance the efficiency and safety of plasma processes.

Latest Patents

Santos's latest patents include "Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potential." This method optimizes the dechuck sequence by analyzing electrical characteristics of plasma during the process. It involves turning off inert gas and adjusting lifter pins to facilitate the removal of substrates from electrodes. Another significant patent is "System and method for plasma arc detection, isolation and prevention." This device works with RF generating sources to create a potential between electrodes and includes a current sink that conducts excess voltage to ground, ensuring safety during operations.

Career Highlights

Ed Santos is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His work focuses on advancing plasma technologies that are crucial for the production of microelectronics.

Collaborations

Santos has collaborated with esteemed colleagues such as John C Valcore, Jr. and Saurabh J Ullal, contributing to the development of innovative solutions in the field.

Conclusion

Ed Santos is a prominent figure in plasma technology, with a focus on optimizing processes and ensuring safety in semiconductor manufacturing. His contributions continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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