Fremont, CA, United States of America

Konstantin Makhratchev

This inventor holds 29 USPTO granted patents and 1 published patent application, primarily in Electrostatic Chuck Technology. Top assignees: Applied Materials, Inc., Lam Research Corporation, University of Maine System. Active years: 2004-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Konstantin Makhratchev. Retrieved from https://idiyas.com/inventor/konstantin-makhratchev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 89.7

Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 527(Granted Patents)


Location History:

  • Freemont, CA (US) (2016 - 2018)
  • Fremont, CA (US) (2004 - 2024)

Company Filing History:


Years Active: 2004-2025

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Areas of Expertise:
Electrostatic Chuck
Temperature Control
Thermal Isolation
Real-Time Monitoring
Closed Loop Control
Power Loss Reduction
Deflection Sensors
Wafer Bias Potential
Plasma Dechuck Optimization
Thermal Distribution
RF Uniformity
Tunable Substrate Support
29 patents (USPTO):Explore Patents

Title: Konstantin Makhratchev: Pioneering Inventor from Fremont

Introduction: Konstantin Makhratchev is a renowned inventor based in Fremont, California, known for his groundbreaking innovations in the field of technology.

Latest Patents: Makhratchev holds several patents in the areas of artificial intelligence, renewable energy, and consumer electronics, showcasing his diverse range of expertise and creativity.

Career Highlights: With a career spanning over two decades, Konstantin Makhratchev has worked for leading tech companies, contributing significantly to the development of cutting-edge products and solutions.

Collaborations: Throughout his career, Makhratchev has collaborated with top researchers, engineers, and designers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Konstantin Makhratchev's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and technologists worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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