The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Dec. 18, 2006
Jason Augustino, Fremont, CA (US);
Anthony DE LA Llera, Fremont, CA (US);
Allan K. Ronne, Santa Clara, CA (US);
Jaehyun Kim, Fremont, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Yen-kun Wang, Union City, CA (US);
Saurabh J. Ullal, South San Francisco, CA (US);
Anthony J. Norell, Newark, CA (US);
Keith Comendant, Fremont, CA (US);
William M. Denty, Jr., San Jose, CA (US);
Jason Augustino, Fremont, CA (US);
Anthony De La Llera, Fremont, CA (US);
Allan K. Ronne, Santa Clara, CA (US);
Jaehyun Kim, Fremont, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Yen-Kun Wang, Union City, CA (US);
Saurabh J. Ullal, South San Francisco, CA (US);
Anthony J. Norell, Newark, CA (US);
Keith Comendant, Fremont, CA (US);
William M. Denty, Jr., San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.